The effect of hydrogen on high-field-induced defects in the dielectric films of MOS structures.

Authors

Hong Lin

Document Type

Dissertation

Date of Award

1997

ProQuest Publication Number

Document on ProQuest

ISBN

978-0-591-58160-7

Comments

PhD - ProQuest publication number 9807880

Recommended Citation

Lin, Hong, "The effect of hydrogen on high-field-induced defects in the dielectric films of MOS structures." (1997). All ETDs from UAB. 6120.
https://digitalcommons.library.uab.edu/etd-collection/6120